JPS5514087B2 - - Google Patents
Info
- Publication number
- JPS5514087B2 JPS5514087B2 JP9928973A JP9928973A JPS5514087B2 JP S5514087 B2 JPS5514087 B2 JP S5514087B2 JP 9928973 A JP9928973 A JP 9928973A JP 9928973 A JP9928973 A JP 9928973A JP S5514087 B2 JPS5514087 B2 JP S5514087B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Polymerisation Methods In General (AREA)
- Paints Or Removers (AREA)
- Epoxy Resins (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9928973A JPS5514087B2 (en]) | 1973-09-05 | 1973-09-05 | |
| FR7430950A FR2242702A1 (en]) | 1973-09-05 | 1974-09-04 | |
| GB3873374A GB1489425A (en) | 1973-09-05 | 1974-09-04 | Photo-curable resin compositions |
| DE19742442527 DE2442527C3 (de) | 1973-09-05 | 1974-09-05 | Photohärtbare Harzmasse auf Basis eines modifizierten Epoxidharzes |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9928973A JPS5514087B2 (en]) | 1973-09-05 | 1973-09-05 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5050106A JPS5050106A (en]) | 1975-05-06 |
| JPS5514087B2 true JPS5514087B2 (en]) | 1980-04-14 |
Family
ID=14243473
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9928973A Expired JPS5514087B2 (en]) | 1973-09-05 | 1973-09-05 |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JPS5514087B2 (en]) |
| DE (1) | DE2442527C3 (en]) |
| FR (1) | FR2242702A1 (en]) |
| GB (1) | GB1489425A (en]) |
Families Citing this family (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4390615A (en) | 1979-11-05 | 1983-06-28 | Courtney Robert W | Coating compositions |
| US4451636A (en) * | 1981-01-16 | 1984-05-29 | W. R. Grace & Co. | Polymer composition having terminal alkene and terminal carboxyl groups |
| US4481281A (en) * | 1981-01-16 | 1984-11-06 | W. R. Grace & Co. | Polymer composition having terminal alkene and terminal carboxyl groups |
| US4442198A (en) * | 1981-01-16 | 1984-04-10 | W. R. Grace & Co. | Polymer composition having terminal alkene and terminal carboxyl groups |
| US4422914A (en) | 1981-01-16 | 1983-12-27 | W. R. Grace & Co. | Polymer composition having terminal alkene and terminal carboxyl groups |
| US4436806A (en) | 1981-01-16 | 1984-03-13 | W. R. Grace & Co. | Method and apparatus for making printed circuit boards |
| EP0091401B1 (de) * | 1982-04-03 | 1986-11-20 | Ciba-Geigy Ag | Herstellung von Prepregs aus cellulosehaltigen Fasern unter Verwendung wässriger Harzzusammensetzungen |
| US4393181A (en) | 1982-06-30 | 1983-07-12 | Shell Oil Company | Polyfunctional phenolic-melamine epoxy resin curing agents |
| DE3447355A1 (de) * | 1984-12-24 | 1986-07-03 | Basf Ag, 6700 Ludwigshafen | Vernetzbares harz, lichtempfindliches aufzeichnungsmaterial auf basis dieses vernetzbaren harzes sowie verfahren zur herstellung einer flachdruckplatte mittels dieses lichtempfindlichen aufzeichnungsmaterials |
| DE3447357A1 (de) * | 1984-12-24 | 1986-07-03 | Basf Ag, 6700 Ludwigshafen | Trockenfilmresist und verfahren zur herstellung von resistmustern |
| JPS61243869A (ja) * | 1985-04-19 | 1986-10-30 | Taiyo Ink Seizo Kk | レジストインキ組成物 |
| DE3619129A1 (de) * | 1986-06-06 | 1987-12-10 | Basf Ag | Lichtempfindliches aufzeichnungselement |
| JPS63186232A (ja) * | 1987-01-28 | 1988-08-01 | Toyobo Co Ltd | 感光性樹脂組成物 |
| EP0292219A3 (en) * | 1987-05-21 | 1989-10-11 | AT&T Corp. | Printed circuit board fabrication |
| DE3717038A1 (de) * | 1987-05-21 | 1988-12-08 | Basf Ag | Photopolymerisierbare aufzeichnungsmaterialien sowie photoresistschichten und flachdruckplatten auf basis dieser aufzeichnungsmaterialien |
| DE3717034A1 (de) * | 1987-05-21 | 1988-12-08 | Basf Ag | Photopolymerisierbare aufzeichnungsmaterialien sowie photoresistschichten und flachdruckplatten auf basis dieser aufzeichnungsmaterialien, sowie neue chinazolon-4-verbindungen |
| DE3717037A1 (de) * | 1987-05-21 | 1988-12-08 | Basf Ag | Photopolymerisierbare aufzeichnungsmaterialien sowie photoresistschichten und flachdruckplatten auf basis dieser aufzeichnungsmaterialien |
| DE3717036A1 (de) * | 1987-05-21 | 1988-12-08 | Basf Ag | Photopolymerisierbare aufzeichnungsmaterialien sowie photoresistschichten und flachdruckplatten auf basis dieser aufzeichnungsmaterialien |
| GB8804044D0 (en) * | 1988-02-22 | 1988-03-23 | Coates Brothers Plc | Coating compositions |
| US5102775A (en) * | 1988-09-30 | 1992-04-07 | Kansai Paint Co., Ltd. | Visible light sensitive electrodeposition coating composition and image-forming method using the same |
| DE69605909D1 (de) * | 1995-04-27 | 2000-02-03 | Minnesota Mining & Mfg | Negativ arbeitende unbehandelte reproduktionsschichten |
| US5925497A (en) * | 1995-04-27 | 1999-07-20 | Minnesota Mining And Manufacturing Company | Negative-acting no-process printing plates |
| CN113583222B (zh) * | 2021-08-24 | 2023-03-24 | 濮阳市盛源能源科技股份有限公司 | 一种嵌段共聚型可降解聚酯及其制备方法 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5640329B2 (en]) * | 1972-04-24 | 1981-09-19 |
-
1973
- 1973-09-05 JP JP9928973A patent/JPS5514087B2/ja not_active Expired
-
1974
- 1974-09-04 GB GB3873374A patent/GB1489425A/en not_active Expired
- 1974-09-04 FR FR7430950A patent/FR2242702A1/fr not_active Withdrawn
- 1974-09-05 DE DE19742442527 patent/DE2442527C3/de not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| FR2242702A1 (en]) | 1975-03-28 |
| DE2442527C3 (de) | 1980-04-10 |
| JPS5050106A (en]) | 1975-05-06 |
| DE2442527A1 (de) | 1975-04-03 |
| DE2442527B2 (de) | 1976-08-12 |
| GB1489425A (en) | 1977-10-19 |